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Nils Schubert

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The Dissolution Behavior of Silicon in Aqueous HF-(HCl)-HClO3-Mixtures: Reactivity Studies, Analytics of Etching Solutions and Surface Morphologies

Number of pages: 33 Posted: 16 Mar 2026
Edwin Kroke, Ann-Lucia Neumann, Nils Schubert, Andre Stapf, Niklas Zomack, Dominic Walter, Andreas Lißner and Andreas Braeuer
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and affiliation not provided to SSRN
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Abstract:

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Silicon, acidic wet chemical etching of semiconductors, chlorate, texturization, polishing, photovoltaic