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Seon-Gyu Kim

affiliation not provided to SSRN

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Scholarly Papers (1)

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Rapid Growth of Tungsten Nanosheet on TiN Surfaces for High-K Metal Gate: A First-Principles Study

Number of pages: 11 Posted: 21 May 2026
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, Pohang University of Science and Technology (POSTECH) and Pohang University of Science and Technology (POSTECH)
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Abstract:

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High-K Metal Gate (HKMG), Tungsten Deposition, Nucleation and Growth, Surface Chemistry, DFT calculations