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huajun Sun

Wuhan University of Technology

Wuhan, 430063

China

  • Wuhan University of Technology

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Scholarly Papers (1)

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In-situ oxygen plasma-assisted ALD of Hf0.5Zr0.5O2 ferroelectric thin films with high endurance and imprint resistance

Number of pages: 32 Posted: 10 Jun 2026
Chao Ye, Quanyao Zhu, Wenqi Sun, Fuling Wu, Zihan Peng, Lei Xiao, Piyu Gong, Ding Shen, Xianjing Tan and huajun Sun
Wuhan University of Technology, Wuhan University of Technology, Wuhan University of Technology, Wuhan University of Technology, Wuhan University of Technology, Shaoyang University, Wuhan University of Technology, Wuhan University of Technology, Wuhan University of Technology and Wuhan University of Technology
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Abstract:

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Hf0.5Zr0.5O2 (HZO), Imprint effect, In-situ assisted oxidation, Oxygen vacancy engineering