David J. Srolovitz

City University of Hong Kong (CityUHK) - Department of Materials Science and Engineering

Hong Kong

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Scholarly Papers (1)

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Grain Growth Stagnation in Thin Films Due to Shear-Coupled Grain Boundary Migration

Number of pages: 16 Posted: 20 Dec 2019
Eugen Rabkin and David J. Srolovitz
Technion-Israel Institute of Technology - Department of Materials Science and Engineering and City University of Hong Kong (CityUHK) - Department of Materials Science and Engineering
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Abstract:

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thin films, grain growth, grain boundary migration, disclinations