Dübendorf, 8600
Switzerland
Swiss Federal Laboratories for Material Science and Technology (EMPA)
Manganese oxides, electrodeposition, Microstructural analysis, Chemical-state, Crystal growth kinetics, Phase transformation
Miscible interfaces, XRD modeling, Disorder, Microstructure, Nanomultilayers
interfaces, modelling, multilayers, nanostructured materials, stress measurement
nanomultilayers, nanoindentation, residual stress, atomistic simulations, Young's modulus
Manganese oxides, Anodic electrodeposition, Calcination, Microstructural analysis, Crystal growth kinetics, Phase transformation
metallic multilayers, thermal stability, vacancy formation, diffusion, nanocomposite
Cu/Nb nanomultilayer, thermal stability, nanomultilayer degradation, Cu hillock growth, nanocomposite
phosphonic acid, aluminum oxide morphology, steric effect, electron environment, intermolecular interactions, XPS
Fe-Cr alloys, co-sputtering, XRD, thin films, phase stability
reduction kinetics, real time XRD, nanoporous structures, thin film oxidation, oxide thin film reduction
interface stress, ab-initio calculations, multilayers, stress in thin layers, interface energy
magnetic thin film, 2 Tesla saturation magnetization, chemically robust, holmium oxide, hysteresis-free, quantitative magnetic metrology