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W. M. Moslem

Port Said University

Port Said, 42526

Egypt

  • Port Said University

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Controlling the Density of Plasma Species in Ar/Cf 4 Radiofrequency Capacitively Coupled Plasma Discharges

Posted: 13 Apr 2023
Mohammed Shihab, Mohamed Gamal, Yasser Abdella, Tarek El-Ashram and W. M. Moslem
Tanta University, Port Said University, Loughborough University - The British University in Egypt, Port Said University and Port Said University

Abstract:

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Ar/CF 4 discharge, plasma species, dry etching, wet etching, deposition, RF-CCPs.