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Muhammad Javid

Hangzhou Dianzi University

China

SCHOLARLY PAPERS

1

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33

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0

Scholarly Papers (1)

1.

Arc-Discharge Plasma Fabrication of In-Situ S-Doped Graphite Shells Encapsulating Feni Magnetic Alloy as Efficient Microwave Absorber

Number of pages: 27 Posted: 18 Aug 2022
Dalian University of Technology, Hangzhou Dianzi University, Dalian University of Technology, Dalian University of Technology, affiliation not provided to SSRN, Dalian University of Technology, Hangzhou Dianzi University, Chinese Academy of Sciences (CAS) - Shenyang National Laboratory for Materials Science and Dalian University of Technology
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Abstract:

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FeNi alloy, arc-discharge plasma, substitutional sulfur atoms, interfacial polarization, impedance matching.