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Jiangong Cheng

Beijing University of Technology

100 Ping Le Yuan

Chaoyang District

Beijing, 100020

China

SCHOLARLY PAPERS

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Scholarly Papers (1)

1.

Impact of Aminosilane and Silanol Precursor Structure on Atomic Layer Deposition Process

Number of pages: 18 Posted: 07 Dec 2022
Beijing University of Technology, Beijing University of Technology, Beijing University of Technology, Beijing University of Technology, affiliation not provided to SSRN and Beijing University of Technology
Downloads 101 (689,572)

Abstract:

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Atomic layer deposition, Rapid atomic layer deposition, Activation barrier, Bond lengths, rate-determining step, Aminosilane/Silanol precursors.