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Marco A. Curado

International Iberian Nanotechnology Laboratory

Avenida Mestre José Veiga s/n

Braga, 4715-330

Portugal

  • International Iberian Nanotechnology Laboratory

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Impact of C4f8 Based Anti-Sticking Layers for High-Resolution Nanoimprint Lithography Processes

Number of pages: 16 Posted: 11 Mar 2023
Tomás Lopes, Tomás S. Lopes, Margarida Monteiro, Andre Violas, António J. N. Oliveira, Marco A. Curado, Bernardo Ferreira, Rita F. Alexandre, Enzo J. Ribeiro, J. P. Teixeira, Guy Brammertz, Paulo A. Fernandes, Bart Vermang and Pedro M. P. Salomé
International Iberian Nanotechnology Laboratory, International Iberian Nanotechnology Laboratory, International Iberian Nanotechnology Laboratory, International Iberian Nanotechnology Laboratory, International Iberian Nanotechnology Laboratory, International Iberian Nanotechnology Laboratory, International Iberian Nanotechnology Laboratory, International Iberian Nanotechnology Laboratory, International Iberian Nanotechnology Laboratory, International Iberian Nanotechnology Laboratory, Hasselt University, International Iberian Nanotechnology Laboratory, Hasselt University and International Iberian Nanotechnology Laboratory
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Nanoimprint, anti-sticking layer, XPS, sub-wavelength features, STU-NIL, IPS®