Mengxiao Wang

Dalian University of Technology

Huiying Rd

DaLian, LiaoNing, 116024

China

SCHOLARLY PAPERS

3

DOWNLOADS

72

TOTAL CITATIONS

0

Scholarly Papers (3)

Impacts of Substrate Materials on Microstructure and Electrochemical Properties of Ti/TiN/TiON Laminated Films for Gene Sequencing Chips

Number of pages: 32 Posted: 21 Jun 2024
Dalian University of Technology, Dalian Chip Materials & Thin Film Technology Co., Ltd, Geneus Technologies (Chengdu) Co., Ltd, Geneus Technologies (Chengdu) Co., Ltd, Dalian University of Technology, Dalian University of Technology, Dalian University of Technology and Dalian University of Technology
Downloads 26 (1,136,825)

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Titanium nitride, Electrode, Magnetron sputtering, Electrochemical performance, residual stress

Impacts of Substrate Materials on Microstructure and Electrochemical Properties of Ti/Tin/Tion Laminated Films for Gene Sequencing Chips

Number of pages: 30 Posted: 30 Jan 2024
Dalian University of Technology, Dalian University of Technology, Dalian Chip Materials & Thin Film Technology Co., Ltd, Geneus Technologies (Chengdu) Co., Ltd, Geneus Technologies (Chengdu) Co., Ltd, Dalian University of Technology, Dalian University of Technology and Dalian University of Technology
Downloads 9 (1,352,152)

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Titanium nitride, Electrode, Magnetron sputtering, electrochemical performance, Residual stress

2.

In-Situ Growth and Reliability of Titanium Nitride Current Collector/Titanium Oxynitride Electrode Laminated Thin Films with Excellent Energy Storage Performance

Number of pages: 16 Posted: 20 Jun 2023
Dalian University of Technology, Dalian Chip Materials & Thin Film Technology Co., Ltd, Geneus Technologies (Chengdu) Co., Ltd, affiliation not provided to SSRN, affiliation not provided to SSRN, Dalian University of Technology, Dalian University of Technology and Dalian University of Technology
Downloads 19 (1,190,272)

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Micro-supercapacitor, In situ growth, TiN/TiOxNy laminated films, Buffer layers, Electrochemical Property

3.

Long-Term Stability of Electrical and Electrochemical Properties of Tin Film in the Atmosphere Environment

Number of pages: 26 Posted: 11 Jun 2024
Dalian University of Technology, Dalian University of Technology, Dalian Chip Materials & Thin Film Technology Co., Ltd, Geneus Technologies (Chengdu) Co., Ltd, Geneus Technologies (Chengdu) Co., Ltd, Dalian University of Technology, affiliation not provided to SSRN and Dalian University of Technology
Downloads 18 (1,202,484)

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TiN films, Magnetron Sputtering, working pressure, oxidation, Residual Stress, Electrochemistry