Huiying Rd
DaLian, LiaoNing, 116024
China
Dalian University of Technology
Titanium nitride, Electrode, Magnetron sputtering, Electrochemical performance, residual stress
Titanium nitride, Electrode, Magnetron sputtering, electrochemical performance, Residual stress
Micro-supercapacitor, In situ growth, TiN/TiOxNy laminated films, Buffer layers, Electrochemical Property
TiN films, Magnetron Sputtering, working pressure, oxidation, Residual Stress, Electrochemistry