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Truong Ba Tai

Chungnam National University

Daejon, 34134

Korea, Republic of (South Korea)

  • Chungnam National University

SCHOLARLY PAPERS

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Scholarly Papers (1)

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Growth Mechanism of Hfo2 Film on H-Terminated Si(100) Surface from Atomic Layer Deposition Process Using Tetrakis(Ethylmethylamino)Hafnium

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Growth Mechanism of Hfo2 Film on H-Terminated Si(100) Surface from Atomic Layer Deposition Process Using Tetrakis(Ethylmethylamino)Hafnium

Number of pages: 23 Posted: 10 Nov 2023
Truong Ba Tai, Jonghun Lim and Hyeyoung Shin
Chungnam National University, affiliation not provided to SSRN and Chungnam National University
Downloads 53 (1,072,374)

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Hafnium oxide (HfO2), Atomic layer deposition (ALD), Tetrakis(ethylmethylamino) hafnium (TEMAH), Chemical reaction mechanism, Density functional theory (DFT)

Growth Mechanism of Hfo2 Film on H-Terminated Si(100) Surface from Atomic Layer Deposition Process Using Tetrakis(Ethylmethylamino)Hafnium

Number of pages: 23 Posted: 16 Mar 2024
Truong Ba Tai, Phuong Nguyen, Jonghun Lim and Hyeyoung Shin
Chungnam National University, Chungnam National University, affiliation not provided to SSRN and Chungnam National University
Downloads 45 (1,157,169)

Abstract:

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Hafnium oxide (HfO2), Atomic layer deposition (ALD), Tetrakis(ethylmethylamino) hafnium (TEMAH), Chemical reaction mechanism, Density Functional Theory (DFT)