Cichun Li

Shenzhen University

3688 Nanhai Road, Nanshan District

Shenzhen, 518060

China

  • Shenzhen University

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Scholarly Papers (1)

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Interfacial Thermal Resistance between Mechanically Exfoliated Nm-Thick Mos2 and Silicon from -60 °C to 50 °C Based on Ns-Et Raman Technique

Number of pages: 29 Posted: 06 Feb 2024
Cichun Li, Jinhao Peng, Jiayi Ou, Tianyu Wang and Yangsu Xie
Shenzhen University, Shenzhen University, Shenzhen University, Westlake University and Shenzhen University
Downloads 17 (1,202,968)

Abstract:

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Interfacial thermal resistance, Low temperature, MoS2, Silicon substrate, ns ET-Raman