Hongliang Yu

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Low-Temperature Fabrication of Boron-Doped Amorphous Silicon Passivating Contact As A Local Selective Emitter for High-Efficiency N -Type Topcon Solar Cells

Number of pages: 21 Posted: 27 Feb 2024
Hongliang Yu, Wei Liu, Haojiang Du, Zunke Liu, Mingdun Liao, Zhenhai Yang, Yuheng Zeng and Jichun Ye
affiliation not provided to SSRN, Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering, affiliation not provided to SSRN, Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering, affiliation not provided to SSRN, Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering and Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering
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TOPCon, boron emitters, low temperature, amorphous silicon, contact resistance