Zeyuan Chen

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Effects of Boron Doping on the Surface Modification and Defect Evolution of Silicon Induced by Proton Implantation and Annealing

Number of pages: 17 Posted: 27 Feb 2024
Zeyuan Chen, Minghuan Cui, Jing Li, Peng Jin, Yiqihui Lan, Xuexin Ren, Yushan Yang, Dongsheng Li, Shen Tielong and Zhiguang Wang
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, Zhengzhou University, Paul Scherrer Institute (PSI), affiliation not provided to SSRN, affiliation not provided to SSRN and Chinese Academy of Sciences (CAS) - Institute of Modern Physics
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Abstract:

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proton beam implantation, Monocrystalline silicon, Raman, TEM, boron doping