Przemyslaw Jozwik

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Depth Profiling of the Si Ion Implantation Induced Disorder and Strain in 4h-Sic and the Thermal Annealing Recovery

Number of pages: 22 Posted: 26 Mar 2024

Gaurav Gupta, Przemyslaw Jozwik, Sunil Ojha, G. Umapati, Akhilesh Pandey and Shyama Rath

University of Delhi, affiliation not provided to SSRN, Inter-University Accelerator Centre, Inter-University Accelerator Centre, affiliation not provided to SSRN and University of Delhi

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