Yue He

University of Shanghai for Science and Technology

  • University of Shanghai for Science and Technology

SCHOLARLY PAPERS

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Scholarly Papers (1)

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Engineering the Defect Distribution Via Boron Doping in Amorphous Tio2 for Robust Photocatalytic No Removal

Number of pages: 29 Posted: 02 Apr 2024
Hongbao Jia, Huan Shang, Yue He, Shuwei Gu, Shuangjun Li, Qing Wang, Shike Wang, Jinghuan Peng, Xichen Feng, Pengpeng Li, Hui Xu, Chengliang Mao, Hao Li, Shuning Xiao, Ding Wang, Guisheng Li and Dieqing Zhang
University of Shanghai for Science and Technology, University of Shanghai for Science and Technology, University of Shanghai for Science and Technology, University of Shanghai for Science and Technology, Shanghai Normal University, Shanghai Normal University, Shanghai Normal University, University of Shanghai for Science and Technology, University of Shanghai for Science and Technology, University of Shanghai for Science and Technology, University of Shanghai for Science and Technology, University of Toronto, affiliation not provided to SSRN, University of Shanghai for Science and Technology, University of Shanghai for Science and Technology, University of Shanghai for Science and Technology and Shanghai Normal University
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NO removal, O2 activation, Engineering the defect distribution, Electronic structure modulation, Photocatalysis.