default author photo

Daniel de Jesus Araujo-Pérez

Universidad Veracruzana

Av. Xalapa

S/n

Xalapa Veracruz, 9100

Mexico

  • Universidad Veracruzana

SCHOLARLY PAPERS

1

DOWNLOADS

22

TOTAL CITATIONS

0

Scholarly Papers (1)

Actions:
Email selected abstracts
1.

Low-Temperature Stabilization of Rutile in W-Doped Titania Thin Films Deposited by Magnetron Co-Sputtering

Number of pages: 8 Posted: 07 May 2024
Jorge Bertin Santaella González, Julián Hernández Torres, Rebeca Cristal Rodríguez-Jiménez, Daniel de Jesus Araujo-Pérez, Carlos Ferreira-Palma, Luis Zamora Peredo, Ma de la Paz Cruz-Jáuregui and Leandro García González
Universidad Veracruzana, Universidad Veracruzana, Universidad Veracruzana, Universidad Veracruzana, Universidad Veracruzana, Universidad Veracruzana, affiliation not provided to SSRN and Universidad Veracruzana
Downloads 22 (1,424,331)

Abstract:

Loading...

Sputtering, microstructure, Rutile, TiO2, Thin films, hardness