Qing Liu

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SCHOLARLY PAPERS

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Process and Characteristics of Cobalt Films Deposited by Thermal Atomic Layer Deposition and Silicide Film Formed

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Process and Characteristics of Cobalt Films Deposited by Thermal Atomic Layer Deposition and Silicide Film Formed

Number of pages: 10 Posted: 13 Dec 2024
Jianfeng Gao, Shuai Yang, Jinjuan Xiang, Weibing Liu, Yanpeng Hu, Zhenxing Wang, Meng Liang, Lin Li, Qing Liu, Guilei Wang, Junfeng Li, Chao Zhao and jun luo
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and affiliation not provided to SSRN
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Thermal ALD, Cobalt films, high temperature thermal annealing, Silicide Film

Process and Characteristics of Cobalt Films Deposited by Thermal Atomic Layer Deposition and Silicide Film Formed

Number of pages: 10 Posted: 13 Dec 2024
Jianfeng Gao, Shuai Yang, Jinjuan Xiang, Weibing Liu, Yanpeng Hu, Zhenxing Wang, Meng Liang, Lin Li, Qing Liu, Guilei Wang, Junfeng Li, Chao Zhao and jun luo
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and affiliation not provided to SSRN
Downloads 8 (1,344,260)

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Thermal ALD, Cobalt films, high temperature thermal annealing, Silicide Film