Na Lin

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Advancing The Photoelectric Performance Of Tube Pecvd-Based Tunnel Oxide Passivating Contact Silicon Solar Cells by Regulating the Activated Phosphorus Concentration in Polysilicon

Number of pages: 19 Posted: 06 Mar 2025
Fenghe Han, Mingdun Liao, Na Lin, Shuo Deng, Ning Song, Weichuang Yang, Zunke Liu, Sheshicheng Chen, Haojiang Du, Wei Liu, Fuping Zhao, Wen Zhang, Yiren Cai, Zhenhai Yang, Yuheng Zeng and Jichun Ye
University of Science and Technology of China (USTC), affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, University of New South Wales (UNSW), Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering, affiliation not provided to SSRN, affiliation not provided to SSRN, Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering and Chinese Academy of Sciences (CAS) - Ningbo Institute of Materials Technology and Engineering
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TOPCon, tube PECVD, polysilicon film, parasitic absorption, phosphorus concentration