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Shahid Iqbal

Ajou University

Woncheon-dong, Yeongtong-gu

Suwon-si, Gyeonggi-do

Korea, Republic of (South Korea)

SCHOLARLY PAPERS

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Scholarly Papers (1)

1.

Effects of Oxygen Pda on High-K Dielectric Properties of Hfo2-Zro2 Nanolaminate Layer in Mos Capacitor

Number of pages: 26 Posted: 06 Mar 2025
Ajou University, Ajou University, Ajou University, Ajou University, Ajou University, Ajou University and Ajou University - Department of Materials Science & Engineering
Downloads 55 (1,010,164)

Abstract:

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high-k dielectric, HfO2, ZrO2, nanolaminate, tetragonal, post-deposition annealing (PDA)