Taehyun Kim

Soongsil University

511, Sangdo-dong, Dongjak-gu

Seoul

Korea, Republic of (South Korea)

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Atomic Layer Deposition of Ru/Rutile Al-Tio2/Ru Layer Stacks for High-Performance Silicon Capacitors

Number of pages: 23 Posted: 28 Mar 2025

Taehyun Kim, Da Eun Lim, Hyeongjun Kim, Hyunmin Nah, Heun Park, Yoon Jang Chung and Woongkyu Lee

Soongsil University, Soongsil University, Soongsil University, affiliation not provided to SSRN, affiliation not provided to SSRN, Korea University and Soongsil University

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