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Washington Santa Rosa

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Tuning Oxygen Partial Pressure in RF Magnetron Sputtering to Suppress Trap States and Boost Charge Kinetics in BiVO4 Photoanodes

Number of pages: 24 Posted: 28 Aug 2025
Renato Vitalino Gonçalves, Washington Santa Rosa, Niqab Khan, Victor Casteneda, Gabriel Nutaline, Ingrid Rodríguez-Gutiérrez, Fabiano Montoro, Vikram ahamiya, Nicola Seriani and Flavio Leandro Souza
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and Brazilian Center for Research in Energy and Materials (CNPEM) - Brazilian Nanotechnology National Laboratory (LNNano)
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BiVO4 photoanode, magnetron sputtering, oxygen partial pressure, surface charge kinetics, DFT calculation