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Haruki Yoshida
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SCHOLARLY PAPERS
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Scholarly Papers (1)
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Difference in Kinetics between Thermal Nitridation and Radical Nitridation Processes of 4H-SiC Surface Considering Simultaneous N-incorporation and N-desorption Reactions
Number of pages: 10
Posted: 13 Sep 2025
Haruki Yoshida,
Takashi Onaya
,
Atsushi Tamura
and
Koji Kita
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,
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Abstract:
SiC, nitridation, kinetics, surface reaction, wide bandgap
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