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Xi Ren

Chengdu University of Technology

Sichuan Province Chengdu City

Huayang Youjian Lao Qu Zhengxi Street No.162

Chengdu 610059, 610213

China

  • Chengdu University of Technology

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Linking molecular signatures of dissolved black carbon to photochemical fate: FT-ICR-MS analysis and mechanistic effects on α-nitroso-β-naphthol degradation

Number of pages: 32 Posted: 25 Oct 2025
Tianlie Luo, Yueyu Ran, Yaling Li, Xi Ren, Dian Liu, Shuya Guo, Zhongyu Guo, Liu Guo, Yihua Li and Willie Peijnenburg
Chengdu University of Technology, Chengdu University of Technology, Chengdu University of Technology, Chengdu University of Technology, Chengdu University of Technology, affiliation not provided to SSRN, Institute of Science Tokyo, Chengdu University of Technology, Chengdu University of Technology and Leiden University
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Abstract:

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dissolved black carbon, α-nitroso-β-naphthol, Fourier transform ion cyclotron resonance mass spectrometry, photodegradation, reactive intermediates, toxicity