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Changui Ahn

affiliation not provided to SSRN

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Scholarly Papers (1)

1.

Plasma-enhanced atomic layer deposition of MgO thin films with superior fluorine plasma resistance for semiconductor equipment applications

Number of pages: 42 Posted: 27 Dec 2025
Korea University, Korea University, affiliation not provided to SSRN, Korea University, Chonbuk National University and affiliation not provided to SSRN
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Abstract:

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plasma resistance, PE-ALD, ALD, MgO, Plasma etching, Etch resistance