Capturing Value from IP in a Global Environment

53 Pages Posted: 25 Jan 2017

See all articles by Juan Alcacer

Juan Alcacer

Harvard University - Strategy Unit

Karin Beukel

University of Copenhagen

Bruno Cassiman

IESE Business School; KU Leuven - Faculty of Business and Economics (FEB)

Date Written: August 27, 2015


This paper documents the strong growth in tools used by firms to protect their intellectual property (IP), develop their know-how, and build and maintain their reputation globally during the last decades. We focus on three tools: patents, trademarks, and industrial designs. We find that, although most IP applications come from a few countries (the United States, European Union, Japan, China, and South Korea), most growth in IP activity has come from middle-income countries, especially in Asia. We observe important differences in the origins of this growth. For example, while in India most applicants were foreign firms, in China most were local. However, most Indian innovations are also applied overseas, while Chinese innovations rarely made it out of China. Interestingly, growth in applications varies by IP tool, with industrial designs experiencing the most growth.

Suggested Citation

Alcacer, Juan and Beukel, Karin and Cassiman, Bruno, Capturing Value from IP in a Global Environment (August 27, 2015). Harvard Business School Strategy Unit Working Paper No. 17-068, Available at SSRN: or

Juan Alcacer (Contact Author)

Harvard University - Strategy Unit ( email )

Harvard Business School
Soldiers Field Road
Boston, MA 02163
United States
617 495-6338 (Phone)
617 495-0355 (Fax)

Karin Beukel

University of Copenhagen ( email )

Nørregade 10
Copenhagen, København DK-1165

Bruno Cassiman

IESE Business School ( email )

Avenida Pearson 21
Barcelona, 08034
+34 93 602 4426 (Phone)
+34 93 253 4343 (Fax)

KU Leuven - Faculty of Business and Economics (FEB) ( email )

Naamsestraat 69
Leuven, B-3000

Do you have a job opening that you would like to promote on SSRN?

Paper statistics

Abstract Views
PlumX Metrics