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Strain Engineering of Epitaxial Oxide Heterostructures Beyond Substrate Limitations

26 Pages Posted: 24 Apr 2019 Publication Status: Published

See all articles by Xiong Deng

Xiong Deng

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Chao Chen

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Deyang Chen

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University - Guangdong Provincial Key Laboratory of Optical Information Materials and Technology

Xiangbin Cai

Hong Kong University of Science & Technology (HKUST) - Department of Physics; Hong Kong University of Science & Technology (HKUST) - Center for Quantum Materials

Chao Xu

Hong Kong Polytechnic University - Department of Applied Physics

Xiaozhe Yin

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Guo Tian

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Zhen Fan

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology

Zhipeng Hou

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology

Minghui Qin

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials

Xubing Lu

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials

Guofu Zhou

South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology; South China Normal University - National Center for International Research on Green Optoelectronics

Lang Chen

Southern University of Science and Technology - Department of Physics

Ning Wang

Hong Kong University of Science & Technology (HKUST) - Department of Physics; Hong Kong University of Science & Technology (HKUST) - Center for Quantum Materials

Ye Zhu

Hong Kong Polytechnic University - Department of Applied Physics

Xingsen Gao

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials

Jun-Ming Liu

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; Nanjing University - Laboratory of Solid State Microstructures; Nanjing University - Innovation Center of Advanced Microstructures

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Abstract

Epitaxial strain, imparted by an underlying substrate, is a powerful pathway to drive phase transitions and dramatically alter properties in oxide heterostructures, enabling the emergence of new ground states and the enhancement of ferroelectricity, piezoelectricity, superconductivity and ferromagnetism. However, the limitation of commercially available single-crystal substrates and the lack of continuous strain tunability preclude the ability to take full advantage of strain engineering for further exploring novel properties and exhaustively studying fundamental physics in complex oxides. Here we report an approach for imposing continuously tunable, large epitaxial strain in oxide heterostructures beyond substrate limitations by inserting an interface layer through tailoring its gradual strain relaxation. Taking BiFeO3 as a model system, we demonstrate that the introduction of an ultrathin interface layer allows the creation of a desired strain that can induce phase transition and stabilize a new metastable super-tetragonal phase as well as morphotropic phase boundaries overcoming substrate limitations. Furthermore, continuously tunable strain from tension to compression can be generated by precisely adjusting the thickness of the interface layer, leading to the first achievement of continuous O-R-T phase transition in BiFeO3 on a single substrate. This proposed route could be extended to other oxide heterostructures, providing a platform for creating exotic phases and emergent phenomena.

Suggested Citation

Deng, Xiong and Chen, Chao and Chen, Deyang and Cai, Xiangbin and Xu, Chao and Yin, Xiaozhe and Tian, Guo and Fan, Zhen and Hou, Zhipeng and Qin, Minghui and Lu, Xubing and Zhou, Guofu and Chen, Lang and Wang, Ning and Zhu, Ye and Gao, Xingsen and Liu, Jun-Ming, Strain Engineering of Epitaxial Oxide Heterostructures Beyond Substrate Limitations (April 23, 2019). Available at SSRN: https://ssrn.com/abstract=3376672 or http://dx.doi.org/10.2139/ssrn.3376672
This version of the paper has not been formally peer reviewed.

Xiong Deng

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Guangzhou
China

Chao Chen

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Guangzhou
China

Deyang Chen (Contact Author)

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials ( email )

Guangzhou
China

South China Normal University - Guangdong Provincial Key Laboratory of Optical Information Materials and Technology ( email )

Guangzhou
China

Xiangbin Cai

Hong Kong University of Science & Technology (HKUST) - Department of Physics

Hong Kong
China

Hong Kong University of Science & Technology (HKUST) - Center for Quantum Materials

Hong Kong
China

Chao Xu

Hong Kong Polytechnic University - Department of Applied Physics

Hong Kong
China

Xiaozhe Yin

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials ( email )

Guangzhou
China

Guo Tian

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials ( email )

Guangzhou
China

Zhen Fan

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Guangzhou
China

South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology

Guangzhou
China

Zhipeng Hou

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Guangzhou
China

South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology

Guangzhou
China

Minghui Qin

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials ( email )

Guangzhou
China

South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials

Guangzhou
China

Xubing Lu

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Guangzhou
China

South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials

Guangzhou
China

Guofu Zhou

South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology

Guangzhou
China

South China Normal University - National Center for International Research on Green Optoelectronics

Guangzhou
China

Lang Chen

Southern University of Science and Technology - Department of Physics

Guangdong
China

Ning Wang

Hong Kong University of Science & Technology (HKUST) - Department of Physics

Hong Kong
China

Hong Kong University of Science & Technology (HKUST) - Center for Quantum Materials

Hong Kong
China

Ye Zhu

Hong Kong Polytechnic University - Department of Applied Physics

Hong Kong
China

Xingsen Gao

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Guangzhou
China

South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials

Guangzhou
China

Jun-Ming Liu

South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials

Guangzhou
China

Nanjing University - Laboratory of Solid State Microstructures

Nanjing
China

Nanjing University - Innovation Center of Advanced Microstructures

Nanjing
China

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