South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University - Guangdong Provincial Key Laboratory of Optical Information Materials and Technology
Hong Kong University of Science & Technology (HKUST) - Department of Physics; Hong Kong University of Science & Technology (HKUST) - Center for Quantum Materials
South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology
South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology
South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials
South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials
South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology; South China Normal University - National Center for International Research on Green Optoelectronics
Hong Kong University of Science & Technology (HKUST) - Department of Physics; Hong Kong University of Science & Technology (HKUST) - Center for Quantum Materials
South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials
South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials; Nanjing University - Laboratory of Solid State Microstructures; Nanjing University - Innovation Center of Advanced Microstructures
Epitaxial strain, imparted by an underlying substrate, is a powerful pathway to drive phase transitions and dramatically alter properties in oxide heterostructures, enabling the emergence of new ground states and the enhancement of ferroelectricity, piezoelectricity, superconductivity and ferromagnetism. However, the limitation of commercially available single-crystal substrates and the lack of continuous strain tunability preclude the ability to take full advantage of strain engineering for further exploring novel properties and exhaustively studying fundamental physics in complex oxides. Here we report an approach for imposing continuously tunable, large epitaxial strain in oxide heterostructures beyond substrate limitations by inserting an interface layer through tailoring its gradual strain relaxation. Taking BiFeO3 as a model system, we demonstrate that the introduction of an ultrathin interface layer allows the creation of a desired strain that can induce phase transition and stabilize a new metastable super-tetragonal phase as well as morphotropic phase boundaries overcoming substrate limitations. Furthermore, continuously tunable strain from tension to compression can be generated by precisely adjusting the thickness of the interface layer, leading to the first achievement of continuous O-R-T phase transition in BiFeO3 on a single substrate. This proposed route could be extended to other oxide heterostructures, providing a platform for creating exotic phases and emergent phenomena.
Deng, Xiong and Chen, Chao and Chen, Deyang and Cai, Xiangbin and Xu, Chao and Yin, Xiaozhe and Tian, Guo and Fan, Zhen and Hou, Zhipeng and Qin, Minghui and Lu, Xubing and Zhou, Guofu and Chen, Lang and Wang, Ning and Zhu, Ye and Gao, Xingsen and Liu, Jun-Ming, Strain Engineering of Epitaxial Oxide Heterostructures Beyond Substrate Limitations (April 23, 2019). Available at SSRN: https://ssrn.com/abstract=3376672 or http://dx.doi.org/10.2139/ssrn.3376672
This version of the paper has not been formally peer reviewed.
South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials
Guangzhou China
South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology
South China Normal University, Academy of Advanced Optoelectronics, Institute for Advanced Materials
Guangzhou China
South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology
South China Normal University, Academy of Advanced Optoelectronics, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology
Guangzhou China
South China Normal University - National Center for International Research on Green Optoelectronics