Structural Stability Under Xe-Ion Irradiation of TiZrNbTaV-Based High-Entropy Alloy and Nitride Films

Abstract

Refractory high-entropy coatings are of interest for applications as fuel cladding due to their corrosion resistant properties and irradiation resistance at elevated temperature. Here, TiZrNbTaV metallic and (TiZrNbTaV)N films were deposited by magnetron co-sputtering. The metal elemental contents of both films were nearly equiatomic. These films were irradiated by Xe ions at room temperature and 500 °C, and examined by X-ray diffraction and transmission electron microscopy. The as-deposited (TiZrNbTaV)N film showed a single NaCl-type fcc phase and a pronounced columnar growth structure, which could remain intact after irradiation treatments. In contrast, the as-deposited TiZrNbTaV film exhibited an amorphous structure and formed a bcc phase structure after irradiation at 500 °C. The TiZrNbTaV film after irradiation at 500 °C composed of depth-dependent size of grains. This distribution of grain size is consistent with simulated displacement damage.

Keywords: High-entropy alloy, nitrides, ions irradiation, Transmission electron microscopy