Uv Light Curing Method to Study the Liquid Distribution Pattern of Gas-Liquid Agglomerated Filter Material Under High Pressure

15 Pages Posted: 9 Jun 2022

See all articles by Yuewen Wang

Yuewen Wang

affiliation not provided to SSRN

Xiaolin Wu

affiliation not provided to SSRN

Cheng Chang

affiliation not provided to SSRN

Zhongli Ji

affiliation not provided to SSRN

Abstract

By using a UV curing method, the reliability of this method is first demonstrated in this paper. This method can be used to study the internal liquid distribution pattern of the filter media, as it can preserve the original appearance of the liquid inside the filter media to the maximum extent. Since the performance degradation mechanism of coalescing filters under high pressure conditions is not clear, it is necessary to know the internal liquid distribution pattern under high pressure to study this point. Therefore, by setting up an experimental device for the performance of the filter material, the maximum experimental pressure of the device is 5MPa., the liquid distribution pattern of oleophilic filter media A and oleophobic filter media B under 1-5 MPa pressure was observed by scanning electron microscopy for the first time with the help of light curing method. The reason was found to be that with the high pressure, the surface tension of the droplets decreased, which changed the distribution form of the droplets on the fibers and enhanced the wettability of the filter media. This finding helps to study the mechanism of the degradation of the performance of the filter element under high pressure, and thus guides the design and manufacture of the coalescing filter applied to the high-pressure field.

Keywords: UV light curing, High pressure, Liquid distribution, Surface tension

Suggested Citation

Wang, Yuewen and Wu, Xiaolin and Chang, Cheng and Ji, Zhongli, Uv Light Curing Method to Study the Liquid Distribution Pattern of Gas-Liquid Agglomerated Filter Material Under High Pressure. Available at SSRN: https://ssrn.com/abstract=4132445 or http://dx.doi.org/10.2139/ssrn.4132445

Yuewen Wang (Contact Author)

affiliation not provided to SSRN ( email )

No Address Available

Xiaolin Wu

affiliation not provided to SSRN ( email )

No Address Available

Cheng Chang

affiliation not provided to SSRN ( email )

No Address Available

Zhongli Ji

affiliation not provided to SSRN ( email )

No Address Available

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