An in Situ Tof-Leis Characterization of the Surface of Ti-Based Thin Films Under Oxygen Exposure and at Elevated Temperatures

Abstract

Ti-based coatings are utilized in a wide variety of applications, from biomedical implants to mechanical tools. Insight into initial stages of processes triggered by gas exposure and temperature change in the near-surface region of such coatings is essential for the understanding of their macroscopic behavior. We present an in situ time-of-flight low-energy ion scattering (ToF-LEIS) approach for the non-destructive and depth-resolved study of composition and morphology of the immediate surface region with sub-nm resolution. Ti-based coatings, with increasing compositional complexity, starting from in situ grown Ti, followed by ex situ grown Ti, TiN, and (Ti,Al)N, are studied concerning effects of exposure to oxygen and elevated temperatures. On the clean in situ deposited Ti surface, a 1.9 nm thick oxide layer is observed after exposure to 4000 Langmuir oxygen at room temperature. In contrast, for ex situ grown samples, an oxidic surface layer not removable by surface ion sputtering is found to limit effects of further oxygen exposure. TiN does not show significant changes when exposed to oxygen at 370 °C. For (Ti,Al)N, a nm-thick Al-rich surface layer is observed at annealing temperatures above 600 °C, both in ultra-high vacuum and in 1.0×10-3 Pa of oxygen.

Keywords: Time-of-flight low-energy ion scattering, surface analysis, high-resolution depth profiling, titanium, transition metal nitride, in situ