Precise Optical Engineering of Carbon-Based Photoluminescence Arrays Based on E-Beam Irradiation Process

Abstract

Carbon-based photoluminescence (PL) nanomaterials have been widely studied for its excellent biocompatibility, chemical stability, low toxicity and obvious PL properties. The reliable fabrication of high-resolution fluorescence arrays has important significance in further studies and applications. Organic resist can be in-situ transferred into carbon-based micro-nano structure with fluorescence properties by focused e-beam irradiation process. In this work, polymethyl methacrylate (PMMA) thin film was adopted for preparing solid-carbon nanostructures with 23.89 nm feature size. In dark field environment, the structure has presented PL phenomenon at ~600 nm location. Considering the significant influence of surface molecular state on solid-carbon arrays, NH3·H2O molecular was usedto enhance the PL strength of sample. The results verified that PL strength was enhanced by a factor of 17 before and after NH3·H2O treatment. Then carbon-based nanostructures were also fabricated on the surface of MoS2 film for studying PL properties between 2D materials and 0D dot arrays. The results show that superposition state was produced based on PL strength and peak location of solid-carbon dot array and MoS2 film. The optical behavior study of high-resolution soli-carbon arrays will provide a powerful supplement for carbon-based photophysical study and high-performance sensing devices.

Keywords: Carbon-based photoluminescence, e-beam irradiation, high-resolution, NH3·H2O, MoS2 film