High Temperature Oxidation Behavior and Mechanism of Gh5188 Alloy Foil

Abstract

The oxidation behavior and mechanism of GH5188 alloy foil was investigated at 980~ 1150 °C. The results showed that the oxidation kinetics of the alloy foil approximated a parabolic law, revealing two distinct stages. After oxidation, a double-layer oxide film was formed on the surface of the alloy foil. SiO2 was discontinuously distributed at the pores along the oxide-substrate interface. Chromium consumption led to the formation and deepening of a carbide-free precipitation zone within the foil. And thermal and growth stresses led to the formation and expansion of cracks in the Cr2O3 layer, eventually resulting in peeling of the film.

Keywords: GH5188, Foil, High temperature oxidation, Oxidation kinetics, Oxide film