Formation of 3d-Cr2(C1-Yoy) at Cr2alc / Alox Interfaces

Abstract

We report on the microstructural characterization of a multilayer AlOx-Cr2AlC thin film grown at 580 °C by direct current magnetron sputtering. Instead of stabilizing a two-dimensional carbide derivative, intentional periodic excess oxygen incorporation during thin film deposition leads to the formation of a 3D-Cr2(C1-yOy) phase within the AlOx-Cr2AlC multilayered film. The microstructure of the film was investigated by combining various imaging techniques in aberration corrected scanning transition electron microscopy. The distribution of C and related defects at atomic scale was revealed by the integrated differential phase contrast method.

Keywords: interface, MAX phase, 3D-Cr2(C1-yOy), C defect, iDPC STEM, DFT