High Atomic Oxygen Erosion Resistance of Mos2-Based Films by Dynamic Redox Mechanism of Ceo2

42 Pages Posted: 22 May 2025

See all articles by Shifan Ju

Shifan Ju

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics

Ji Li

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics

Xiaohong Liu

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics

Xiaoqin Zhao

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics

Zhou Huidi

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics

Chen Jianmin

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics

Li Hong-xuan

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics

Junshuai Li

Lanzhou University

Abstract

Low Earth orbit atomic oxygen (AO) exposure may induce irreversible degradation in spacecraft surface MoS₂-based films. Here, we demonstrate that doping rare earth compounds in molybdenum disulfide (MoS2)-based films can optimize the structure and properties of MoS2-based films. However, distinct modification effects exist among different rare earth compounds. The most interesting of these is our finding that doping with CeO2 not only optimizes the structure of MoS2 (a rare-earth element commonality), but also confers dynamic redox self-healing properties to the films, a mechanism derived from the synergistic effect between reversible Ce3+/Ce4+ conversion and oxygen vacancy dynamic equilibrium. These mechanisms enable both films to maintain ultra-low friction coefficients below 0.02 and frictional lifetimes exceeding 1×106 laps after AO irradiation.

Keywords: Key words: Rare earth doping, AO, Molybdenum disulfide-based films, Dynamic redox

Suggested Citation

Ju, Shifan and Li, Ji and Liu, Xiaohong and Zhao, Xiaoqin and Huidi, Zhou and Jianmin, Chen and Hong-xuan, Li and Li, Junshuai, High Atomic Oxygen Erosion Resistance of Mos2-Based Films by Dynamic Redox Mechanism of Ceo2. Available at SSRN: https://ssrn.com/abstract=5264233 or http://dx.doi.org/10.2139/ssrn.5264233

Shifan Ju (Contact Author)

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics ( email )

Ji Li

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics ( email )

Lanzhou, 730000
China

Xiaohong Liu

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics ( email )

Lanzhou, 730000
China

Xiaoqin Zhao

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics ( email )

Zhou Huidi

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics ( email )

Lanzhou, 730000
China

Chen Jianmin

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics ( email )

Lanzhou, 730000
China

Li Hong-xuan

Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics ( email )

Lanzhou, 730000
China

Junshuai Li

Lanzhou University ( email )

222 Tianshui South Road
Chengguan
Lanzhou, 730000
China

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