Download This Paper
Microstructures, Mechanical Behavior, and Radiation Damage of (Tivcr)X-(Taw)1-X Binary System High-Entropy Alloy Films
36 Pages Posted: 29 Apr 2020 Publication Status: Under Review
Abstract
The (TiVCr)x-(TaW)1-x binary system thin films were deposited by a magnetron sputtering system with two intermediate alloy targets. The elemental composition were adjusted by tuning the currents of the two targets, and the value of x in the (TiVCr)x-(TaW)1-x binary system changes from 25 to 90 with the current changes. The surface morphology, roughness, element composition and phase structure of the coatings were studied. With increasing the value of x, the film changes from body-centered-cubic (BCC) to BCC + amorphous structures, and the surface morphology and roughness also show a certain correlation with the phase-structure transition. The research focuses on the mechanical properties and radiation response of the film. The nanoindentation method is used to analyze the hardness and modulus of the material, and the wear resistance of the material is analyzed through reciprocating abrasion experiments. The influence of the 70Kev He+ ions implantation on the structure and microstructure was investigated. The results show that at x=0.51, the film exhibits the best mechanical properties under the action of various strengthening mechanisms. On the other hand, forming a BCC polycrystalline structure and an amorphous mixed structure can improve the radiation resistance of the material.
Keywords: high-entropy alloy, magnetron sputtering, co-deposition, mechanical behavior, friction properties, radiation damage
Suggested Citation: Suggested Citation