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Woohyuk Kim

affiliation not provided to SSRN

  • affiliation not provided to SSRN

SCHOLARLY PAPERS

2

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157

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0

Scholarly Papers (2)

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1.

Enhancing Oxide/Nitride Selectivity in Area-Selective Atomic Layer Deposition via Pyridine-Catalyzed Inhibition

Number of pages: 22 Posted: 19 Jan 2026
Jieun Oh, Woohyuk Kim, Hyeonggeun Lim, Soyoung Lee and Woo-Hee Kim
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and Hanyang University
Downloads 91 (759,537)

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Area-selective atomic layer deposition, Small molecule inhibitor, Catalyst, Surface activation, Bottom-up nanofabrication

2.

Topographically Selective Atomic Layer Deposition of HfO2 Thin Films in High Aspect Ratio Structures by Vapor-Dosed Surface Protector

Number of pages: 31 Posted: 30 Jan 2026
Jiwoo Oh, Chang Mo Yoon, Dong-Hyun Im, Yongju Kwon, Jeongbin Lee, Woohyuk Kim, Daeyeong Kim, Yongjoo Park and Woo-Hee Kim
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and Hanyang University
Downloads 66 (980,173)

Abstract:

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Topographically selective atomic layer deposition, HfO2 film, Supercycle ALD, High-aspect-ratio structure, Surface protector, Inverse-gradient growth