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Yongju Kwon

affiliation not provided to SSRN

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Topographically Selective Atomic Layer Deposition of HfO2 Thin Films in High Aspect Ratio Structures by Vapor-Dosed Surface Protector

Number of pages: 31 Posted: 30 Jan 2026
Jiwoo Oh, Chang Mo Yoon, Dong-Hyun Im, Yongju Kwon, Jeongbin Lee, Woohyuk Kim, Daeyeong Kim, Yongjoo Park and Woo-Hee Kim
affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN, affiliation not provided to SSRN and Hanyang University
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Topographically selective atomic layer deposition, HfO2 film, Supercycle ALD, High-aspect-ratio structure, Surface protector, Inverse-gradient growth