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Muqing Zhang

affiliation not provided to SSRN

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Multi-scale Defects Induced by Strong Oxidants in 4H-SiC Polishing

Number of pages: 21 Posted: 04 Mar 2026
Xiufang Chen, Xuanyi Zhao, Muqing Zhang, Dongyue Wu, Chuibang Jia, Dapeng Chang, Fangyuan Liu, Jiaxin Zhang, Huiqing Chen, Mengyan Li, Xianglong Yang and Xiangang Xu
Shandong University, Shandong University, affiliation not provided to SSRN, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University and Shandong University
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Abstract:

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4H-SiC, Chemical mechanical polishing (CMP), Strong oxidants, Multi-scale defects, Surface integrity, Scatter normal (ScN) imaging