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Xuanyi Zhao

Shandong University

27 Shanda Nanlu

South Rd.

Jinan, SD 250100

China

SCHOLARLY PAPERS

3

DOWNLOADS

95

TOTAL CITATIONS

0

Scholarly Papers (3)

1.

Activating Chemical Inertness in GaN for High-Speed Polishing: A Subsurface Microstructure-Driven Paradigm

Number of pages: 20 Posted: 29 Oct 2025
Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University and Shandong University
Downloads 55 (1,031,043)

Abstract:

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Gallium nitride (GaN), Chemical mechanical polishing (CMP), Ductile-mode grinding, subsurface damage, Phase transformation, Material removal rate

2.

Multi-scale Defects Induced by Strong Oxidants in 4H-SiC Polishing

Number of pages: 21 Posted: 04 Mar 2026
Shandong University, Shandong University, affiliation not provided to SSRN, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University and Shandong University
Downloads 21 (1,448,301)

Abstract:

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4H-SiC, Chemical mechanical polishing (CMP), Strong oxidants, Multi-scale defects, Surface integrity, Scatter normal (ScN) imaging

3.

The Mechanism of Hydroxylamine-Promoted Fenton-Like Reaction for improving GaN CMP process

Number of pages: 18 Posted: 18 Nov 2025
Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, affiliation not provided to SSRN, Qilu University of Technology, Shandong University, Shandong University and Shandong University
Downloads 19 (1,481,165)

Abstract:

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Gallium nitride, Fenton reaction, Chemical Mechanical Polishing, Hydroxylamine, Material removal