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Ge Tian

affiliation not provided to SSRN

  • affiliation not provided to SSRN

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The Mechanism of Hydroxylamine-Promoted Fenton-Like Reaction for improving GaN CMP process

Number of pages: 18 Posted: 18 Nov 2025
Hao Guan, Qiubo Li, Xuanyi Zhao, Yuzhu Wu, Tong Peng, Qun Wang, Mengxin Wang, Ge Tian, Jiaoxian Yu, Guodong Wang, Xiangang Xu and lei zhang
Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, Shandong University, affiliation not provided to SSRN, Qilu University of Technology, Shandong University, Shandong University and Shandong University
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Abstract:

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Gallium nitride, Fenton reaction, Chemical Mechanical Polishing, Hydroxylamine, Material removal