default author photo

Gaurav Ashish Kamat

Stanford University

367 Panama St

Stanford, CA 94305

United States

  • Stanford University

SCHOLARLY PAPERS

1

DOWNLOADS

103

TOTAL CITATIONS

0

Scholarly Papers (1)

Actions:
Email selected abstracts
1.

Origins of Wear-Induced Tungsten Corrosion Defects in Semiconductor Manufacturing During Tungsten Chemical Mechanical Polishing

Number of pages: 29 Posted: 22 Apr 2022
Seung-Hoon Choi, Melissa E. Kreider, Adam C. Nielander, Michaela Burke Stevens, Gaurav Ashish Kamat, Ja Eung Koo, Ki Ho Bae, Hoyoung Kim, Il Young Yoon, Bo Un Yoon, Kihyun Hwang, Dong Un Lee and Thomas F. Jaramillo
Stanford University, Stanford University, Stanford University, Stanford University, Stanford University, Samsung Electronics Co., Ltd., Samsung Electronics Co., Ltd., Samsung Electronics Co., Ltd., Samsung Electronics Co., Ltd., Samsung Electronics Co., Ltd., Samsung Electronics Co., Ltd., Stanford University and Stanford University
Downloads 103 (674,591)

Abstract:

Loading...

Chemical mechanical polishing, tungsten, Corrosion, CMOS integrated circuit, contact plug, inductively coupled plasma mass spectrometry