UFR 927, 4 Place Jussieu
Paris, PA F-75252
France
Sorbonne University
Titania films, Atomic Layer Deposition, ion beam analysis, X-ray photoelectron spectroscopy, electronic structure, impurities
boron implantation, backscattering, Si1-xGex, NRA, boron retention factor
Atomic Layer Deposition (ALD), Thin Film, TiO2, Anti-corrosion, Ion beam analysis (IBA).
Oxyhydroxides, Europium, Rare earths, pulsed laser deposition, Ion beam analysis, Thin films