Box 513
Uppsala, 751 20
Sweden
Uppsala University
transparent conductive oxide, nanopatterning, thermoelectric, thermal conduction barrier
Surface acoustic wave filter, SiOXNY, reactive sputtering, passivation layer, silanol group, uHAST
Hot-filament chemical vapor deposition (HF-CVD), Boron-doped diamond (BDD), Carbon-to-hydrogen ratio (C/H ratio)