Ülikooli 18
Tartu 50090, 50090
Estonia
University of Tartu
A1. Crystal structure, A1. Surface processes, A3. Atomic layer epitaxy, A3. Plasma-assisted deposition, B1. Aluminum oxide, B2. Dielectric materials
Electroaerodynamics, Multiphysics simulation, Corona discharge, Threshold inception, Drift-diffusion