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Lile Xie

Tsinghua University

Beijing, 100084

China

  • Tsinghua University

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Effect of Ionic Surfactants in Ceria-Based Slurries on Shallow Trench Isolation Chemical Mechanical Polishing

Number of pages: 26 Posted: 02 Mar 2023
Lifei Zhang, Lile Xie and Xinchun Lu
Tsinghua University, Tsinghua University and Tsinghua University
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Abstract:

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Keywords: Chemical Mechanical Polishing, Shallow Trench Isolation, Ceria-based Slurries, Ionic Surfactants.