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Controlling the Surface Silanol Density in Capillary Columns and Planar Silicon Via the Self-Limiting Gas-Phase Deposition of Tris(Dimethylamino)Methylsilane, and Quantification of Surface Silanols after Silanization by Low Energy Ion Scattering

Number of pages: 31 Posted: 24 May 2023

Behnam Moeini, Joshua W. Pinder, Tahereh G. Avval, Collin Jacobsen, Hidde H. Brongersma, Stanislav Průša, Pavel Bábík, Elena Vaníčková, Morris D. Argyle, Brian R. Strohmeier, Brian Jones, Daniel Shollenberger, David S. Bell and Matthew Linford

Brigham Young University, Brigham Young University, Brigham Young University, Brigham Young University, Eindhoven University of Technology (TUE), Masaryk University - Central European Institute of Technology, Masaryk University - Central European Institute of Technology, Masaryk University - Central European Institute of Technology, Brigham Young University, Avery Dennison Corp, Restek Corp, Restek Corp, Restek Corp and Brigham Young University

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Citation 47

Daniel Shollenberger

Restek Corp

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Scholarly Papers (1)

Controlling the Surface Silanol Density in Capillary Columns and Planar Silicon Via the Self-Limiting Gas-Phase Deposition of Tris(Dimethylamino)Methylsilane, and Quantification of Surface Silanols after Silanization by Low Energy Ion Scattering

Abstract: