Author Page for Tahereh G. Avval

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A Tag-and-Count Approach for Quantifying Surface Silanol Densities on Fused Silica Based on Atomic Layer Deposition and High-Sensitivity Low-Energy Ion Scattering

Number of pages: 38 Posted: 16 Feb 2022

Matthew Linford, Tahereh G. Avval, Stanislav Průša, Cody V. Cushman, Grant T. Hodges, Sarah Fearn, Jan Čechal, Tomáš Šikola and Hidde H. Brongersma

Brigham Young University, Brigham Young University, Masaryk University - Central European Institute of Technology, Corning Incorporated, affiliation not provided to SSRN, Imperial College London, Brno University of Technology, affiliation not provided to SSRN and Eindhoven University of Technology (TUE)

Downloads 67 (899,324)

Citation 1

Abstract:

Controlling the Surface Silanol Density in Capillary Columns and Planar Silicon Via the Self-Limiting Gas-Phase Deposition of Tris(Dimethylamino)Methylsilane, and Quantification of Surface Silanols after Silanization by Low Energy Ion Scattering

Number of pages: 31 Posted: 24 May 2023

Behnam Moeini, Joshua W. Pinder, Tahereh G. Avval, Collin Jacobsen, Hidde H. Brongersma, Stanislav Průša, Pavel Bábík, Elena Vaníčková, Morris D. Argyle, Brian R. Strohmeier, Brian Jones, Daniel Shollenberger, David S. Bell and Matthew Linford

Brigham Young University, Brigham Young University, Brigham Young University, Brigham Young University, Eindhoven University of Technology (TUE), Masaryk University - Central European Institute of Technology, Masaryk University - Central European Institute of Technology, Masaryk University - Central European Institute of Technology, Brigham Young University, Avery Dennison Corp, Restek Corp, Restek Corp, Restek Corp and Brigham Young University

Downloads 38 (1,209,354)

Citation 47

Tahereh G. Avval

Brigham Young University

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Scholarly Papers (2)

A Tag-and-Count Approach for Quantifying Surface Silanol Densities on Fused Silica Based on Atomic Layer Deposition and High-Sensitivity Low-Energy Ion Scattering

Abstract:

Controlling the Surface Silanol Density in Capillary Columns and Planar Silicon Via the Self-Limiting Gas-Phase Deposition of Tris(Dimethylamino)Methylsilane, and Quantification of Surface Silanols after Silanization by Low Energy Ion Scattering

Abstract: