Nannan Zhang

Hebei University of Technology

Tianjin

China

  • Hebei University of Technology

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Scholarly Papers (1)

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Effects of Pyrazine and its Derivatives as Inhibitors on Copper Film Chemical-Mechanical Polishing Properties For Ruthenium-Based Copper Interconnect

Number of pages: 38 Posted: 06 Dec 2023
Ni Zhan, Chao He, Xinhuan Niu, Nannan Zhang, Yida Zou, Jianghao Liu, Changxin Dong, Xinjie Li and Jianwei Zhou
Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology and Hebei University of Technology
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Abstract:

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Chemical mechanical polishing, Inhibitor, Pyrazine, Weakly alkaline slurry