Author Page for Xinjie Li

Effects of Pyrazine and its Derivatives as Inhibitors on Copper Film Chemical-Mechanical Polishing Properties For Ruthenium-Based Copper Interconnect

Number of pages: 38 Posted: 06 Dec 2023

Ni Zhan, Chao He, Xinhuan Niu, Nannan Zhang, Yida Zou, Jianghao Liu, Changxin Dong, Xinjie Li and Jianwei Zhou

Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology and Hebei University of Technology

Downloads 17 (1,211,013)

Abstract:

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Effects and Action Mechanisms of Green Anionic Surfactants on Slurry and Chemical Mechanical Polishing Performance of C-, A- and R-Plane Sapphire: Combined Experiments and Theoretical Calculations

Downloads 14 (1,246,272)

2

Effects and Action Mechanisms of Green Anionic Surfactants on Slurry and Chemical Mechanical Polishing Performance of C-, A- and R-Plane Sapphire: Combined Experiments and Theoretical Calculations

Number of pages: 28 Posted: 22 Mar 2025

Yida Zou, Bin Hu, Xinhuan Niu, Jiakai Zhou, Jianghao Liu, Xinjie Li, Chao He, Ni Zhan and Changxin Dong

Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology and Hebei University of Technology

Downloads 11 (1,328,643)

Abstract:

Effects and Action Mechanisms of Green Anionic Surfactants on Slurry and Chemical Mechanical Polishing Performance of C-, A- and R-Plane Sapphire: Combined Experiments and Theoretical Calculations

Number of pages: 28 Posted: 09 Apr 2025

Yida Zou, Xinhuan Niu, Bin Hu, Jiakai Zhou, Ni Zhan, Jianghao Liu, Xinjie Li, Chao He and Changxin Dong

Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology and Hebei University of Technology

Downloads 3 (1,394,407)

Abstract:

3.

Effect of Amino Acid Inhibitors with Functional Groups in R-Groups on the Chemical Mechanical Polishing Performance and Mechanistic Insights of Copper Films: Combining Experiments and Atomic Level Theoretical Calculations

Number of pages: 28 Posted: 16 May 2025

Zheng Wu, Xinhuan Niu, Jiakai Zhou, Changxin Dong, Chao He, Xinjie Li, Jiahui Li and Bin Hu

Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology, Hebei University of Technology and Hebei University of Technology

Downloads 9 (1,297,221)

Xinjie Li

Hebei University of Technology

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Scholarly Papers (3)

Effects of Pyrazine and its Derivatives as Inhibitors on Copper Film Chemical-Mechanical Polishing Properties For Ruthenium-Based Copper Interconnect

Abstract:

Effects and Action Mechanisms of Green Anionic Surfactants on Slurry and Chemical Mechanical Polishing Performance of C-, A- and R-Plane Sapphire: Combined Experiments and Theoretical Calculations

Effects and Action Mechanisms of Green Anionic Surfactants on Slurry and Chemical Mechanical Polishing Performance of C-, A- and R-Plane Sapphire: Combined Experiments and Theoretical Calculations

Abstract:

Effects and Action Mechanisms of Green Anionic Surfactants on Slurry and Chemical Mechanical Polishing Performance of C-, A- and R-Plane Sapphire: Combined Experiments and Theoretical Calculations

Abstract:

Effect of Amino Acid Inhibitors with Functional Groups in R-Groups on the Chemical Mechanical Polishing Performance and Mechanistic Insights of Copper Films: Combining Experiments and Atomic Level Theoretical Calculations

Abstract: