Eduardo Solano

ALBA Synchrotron

Catalonia, E-08290

Spain

SCHOLARLY PAPERS

3

DOWNLOADS

182

TOTAL CITATIONS

0

Scholarly Papers (3)

1.

Impact of Thickness in Ultra-Thin Ald-Processed Hfo2 Gate Dielectric on the Performance of Low-Operating Voltage Thin-Film Transistors

Number of pages: 23 Posted: 22 Jan 2024
Shanghai University, Shanghai University, ALBA Synchrotron, University of Vigo, Chinese Academy of Sciences (CAS) - Shanghai Advanced Research Institute, Shanghai University, Shanxi Datong University, Shanghai University and European Synchrotron Radiation Facility (ESRF)
Downloads 106 (555,542)

Abstract:

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HfO2 thin films, x-ray scattering, Atomic layer deposition, Thin film transistors

2.

Site Cation Engineering and Anion Exchange Combined Approach to Tune the Optical Properties of 2D Perovskites

Number of pages: 22 Posted: 15 Jan 2025
Universidad de Córdoba, University of Castilla-La Mancha, Universidad de Córdoba, ALBA Synchrotron, University of Vigo, KU Leuven - Departement Natuurkunde en Sterrenkunde, Celestijnenlaan 200d, KU Leuven and KU Leuven
Downloads 40 (938,527)

Abstract:

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A-Site Cation Engineering, Anion Exchange, Quasi-2D Ruddlesden-Popper Perovskite, n-Phases, Light-Emitting Devices

3.

Impact of Thickness in Ultra-Thin Atomic-Layer-Deposition-Processed Hfo2 Gate Dielectric on the Performance of Low-Operating Voltage Thin-Film Transistors

Number of pages: 24 Posted: 31 Aug 2024
Shanghai University, Shanghai University, ALBA Synchrotron, University of Vigo, Chinese Academy of Sciences (CAS) - Shanghai Advanced Research Institute, Shanghai University, Shanxi Datong University, Shanghai University and European Synchrotron Radiation Facility (ESRF)
Downloads 36 (978,107)

Abstract:

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HfO2 thin films, x-ray scattering, Atomic layer deposition, Thin film transistors